When: 2011-02-27 to 2011-03-04
Country/City: U.S.A., San Jose
Venue: San Jose Convention Center
Related Industries: Industrial Goods trade show
Description:
SPIE Advanced Lithography is the internationally recognized forum for reporting state-of-the-art research and development in optical lithography, resists, metrology, EUV, immersion, double patterning, DFM, and imprint lithography. SPIE Advanced Lithography draws over 4,000 attendees and 140 exhibitors, representing the most talented researchers and managers working in the lithography industry.
For Visitor:
Professionals related to Lithographic Technologies, Metrology, Inspection, and Process Control, Optical Microlithography, Data Analysis and Modeling for Patterning Control, Design and Process Integration are the target attendees.
Exhibit profile:
Profile for exhibit includes Lithography: immersion, double patterning, e-beam, EUV, optical/laser, RET, Metrology, inspection, OPC, and process control, Electronic imaging components, equipment, and systems + Resist materials and processing + Nano-imprint + Design for Manufacturability/DPI + IC and chip fabrication/DPI.
